Model-based control of rapid thermal processes

Author

Breedijk, Terence ; Edgar, Thomas F. ; Trachtenberg, Isaac

Author_Institution

Dept. of Chem. Eng., Texas Univ., Austin, TX, USA

Volume

1

fYear

1994

fDate

29 June-1 July 1994

Firstpage

887

Abstract

Parameter estimation of a nonlinear dynamic model for a rapid thermal processing system in single wafer semiconductor processing has been performed. A model transformation is presented that significantly improves the conditioning of the control system. A successively linearized quadratic dynamic matrix control (QDMC) strategy using the model transformation has been developed. Experimental results of the control strategy are presented and compared with internal model control (IMC) with gain scheduling. The nonlinear controller presented in this paper shows superior performance for the test case studied.

Keywords

distributed parameter systems; linear quadratic control; nonlinear control systems; optimisation; parameter estimation; process control; rapid thermal processing; semiconductor process modelling; gain scheduling; internal model control; model transformation; model-based control; nonlinear controller; nonlinear dynamic model; parameter estimation; rapid thermal processes; single wafer semiconductor processing; successively linearized quadratic dynamic matrix control strategy; Boundary conditions; CMOS technology; Nonlinear control systems; Nonlinear dynamical systems; Nonlinear equations; Predictive models; Rapid thermal processing; Semiconductor device modeling; Semiconductor process modeling; Temperature;

fLanguage

English

Publisher

ieee

Conference_Titel

American Control Conference, 1994

Print_ISBN

0-7803-1783-1

Type

conf

DOI

10.1109/ACC.1994.751871

Filename

751871