Title :
Nonlinear system identification and control of a reactive ion etcher
Author :
Vincent, T.L. ; Khargonekar, P.P. ; Rashap, B.A. ; Terry, E. ; Elta, M.
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., Michigan Univ., Ann Arbor, MI, USA
fDate :
29 June-1 July 1994
Abstract :
This paper presents experimental results on empirical nonlinear models (of the Hammerstein type) for a reactive ion etcher. A nonlinear tracking controller design based on the nonlinear model was implemented. Experimental data on the performance of the control system is also included.
Keywords :
identification; nonlinear control systems; process control; sputter etching; Hammerstein type models; empirical nonlinear models; nonlinear system identification; nonlinear tracking controller; reactive ion etcher; Control system synthesis; Control systems; Etching; Nonlinear control systems; Nonlinear systems; Plasma applications; Plasma materials processing; Semiconductor device manufacture; Semiconductor process modeling; Virtual manufacturing;
Conference_Titel :
American Control Conference, 1994
Print_ISBN :
0-7803-1783-1
DOI :
10.1109/ACC.1994.751874
