Title :
Evaluation for fab performance using CPO
Author :
Ito, Yukiko ; Ogawa, Hajime ; Tani, Hiromichi
Author_Institution :
Electron. Devices Group, Fujitsu Ltd., Kawasaki, Japan
Abstract :
We have tried to evaluate the investment effect of a semiconductor device factory by grasping the process cost precisely, classifying its structure, and identifying useless cost factors. As an evaluation index we defined and used the CPO (Cost of Process Ownership), which is the cost per wafer in each process step based on the configuration of equipment installed in the factory and the configuration of product types manufactured there. This index was developed by making some improvements to the CEO (Cost of Equipment Ownership) model. We report the definition of the CPO we are using and some examples of CPO utilization
Keywords :
costing; economics; investment; semiconductor device manufacture; CPO; Cost of Process Ownership; evaluation index; investment; process costs; semiconductor fabs; Costs; Electric breakdown; Investments; Manufacturing processes; Production facilities; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor devices; Throughput; Virtual manufacturing;
Conference_Titel :
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location :
Austin, TX
Print_ISBN :
0-7803-2928-7
DOI :
10.1109/ISSM.1995.524401
