DocumentCode
3353174
Title
Use of process flow in semiconductor manufacturing
Author
Fukuda, Etsuo
Author_Institution
Semicond. Manuf. Eng. Center, Toshiba Corp., Kawasaki, Japan
fYear
1995
fDate
17-19 Sep 1995
Firstpage
257
Lastpage
261
Abstract
Despite the usefulness in semiconductor manufacturing of various systems such as CIM and the Virtual Factory, process/device engineers must learn how to operate such systems, which is very time consuming. These concerns are due to differences in data format and difficulties in information exchange among systems. In next-generation device development, represented by the 1G DRAM, in order to achieve improvements in synthetic production efficiency, information standardization is needed. In particular, standardization of “process flow” is the most important factor in integrating various systems associated with semiconductor manufacturing. This paper describes a system which integrates various systems using standardized process flow data and five interface programs
Keywords
computer integrated manufacturing; process control; semiconductor device manufacture; standardisation; CIM; Virtual Factory; data format; information exchange; information standardization; integrated system; interface programs; process flow; semiconductor manufacturing; synthetic production efficiency; Computer aided manufacturing; Computer aided software engineering; Computer integrated manufacturing; Delay effects; Large scale integration; Manufacturing processes; Production; Semiconductor device manufacture; Testing; Virtual manufacturing;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
Conference_Location
Austin, TX
Print_ISBN
0-7803-2928-7
Type
conf
DOI
10.1109/ISSM.1995.524403
Filename
524403
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