• DocumentCode
    3353174
  • Title

    Use of process flow in semiconductor manufacturing

  • Author

    Fukuda, Etsuo

  • Author_Institution
    Semicond. Manuf. Eng. Center, Toshiba Corp., Kawasaki, Japan
  • fYear
    1995
  • fDate
    17-19 Sep 1995
  • Firstpage
    257
  • Lastpage
    261
  • Abstract
    Despite the usefulness in semiconductor manufacturing of various systems such as CIM and the Virtual Factory, process/device engineers must learn how to operate such systems, which is very time consuming. These concerns are due to differences in data format and difficulties in information exchange among systems. In next-generation device development, represented by the 1G DRAM, in order to achieve improvements in synthetic production efficiency, information standardization is needed. In particular, standardization of “process flow” is the most important factor in integrating various systems associated with semiconductor manufacturing. This paper describes a system which integrates various systems using standardized process flow data and five interface programs
  • Keywords
    computer integrated manufacturing; process control; semiconductor device manufacture; standardisation; CIM; Virtual Factory; data format; information exchange; information standardization; integrated system; interface programs; process flow; semiconductor manufacturing; synthetic production efficiency; Computer aided manufacturing; Computer aided software engineering; Computer integrated manufacturing; Delay effects; Large scale integration; Manufacturing processes; Production; Semiconductor device manufacture; Testing; Virtual manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on
  • Conference_Location
    Austin, TX
  • Print_ISBN
    0-7803-2928-7
  • Type

    conf

  • DOI
    10.1109/ISSM.1995.524403
  • Filename
    524403