Evaluation for fab performance using CPO

Author

Ito, Yukiko ; Ogawa, Hajime ; Tani, Hiromichi

Author_Institution

Electron. Devices Group, Fujitsu Ltd., Kawasaki, Japan

fYear

1995

fDate

17-19 Sep 1995

Firstpage

288

Lastpage

291

Abstract

Tries to evaluate the investment effect ofthe whole factory by grasping the process cost precisely, classifying its structure, and identifying useless cost factors. As an evaluation index, we defined and used the CPO (Cost of Process Ownership), which is the cost per wafer in each process step based on the configuration of equipment installed in the factory and the configuration of product types manufactured there. This index was developed by making some improvements to the CEO (Cost of Equipment Ownership) model. We will report the definition ofthe CPO we are using and some examples of CPO utilization

Keywords

economics; factory automation; integrated circuit manufacture; investment; production control; semiconductor process modelling; CEO; CPO; cost factors; cost of equipment ownership; cost of process ownership; evaluation index; fab performance; factory; investment; process cost; product types; Costs; Electric breakdown; Investments; Manufacturing processes; Production facilities; Semiconductor device breakdown; Semiconductor device manufacture; Semiconductor device modeling; Throughput; Virtual manufacturing;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on

Conference_Location

Austin, TX

Print_ISBN

0-7803-2928-7

Type

conf

DOI

10.1109/ISSM.1995.524409

Filename

524409