Through-UHV-Pump Impurity Back Diffusion Under Large Gas Flow and Its Minimization

Author

Shihata, T. ; Ino, K. ; Konishi, N. ; Ohmi, T. ; Urano, C. ; Enosawa, H.

fYear

1995

fDate

17-19 Sep 1995

Firstpage

288

Keywords

Fluid flow; Fluid flow measurement; Gases; Impurities; Needles; Pressure measurement; Throughput; Vacuum systems; Valves; Velocity measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing, 1995., IEEE/UCS/SEMI International Symposium on

Print_ISBN

0-7803-2928-7

Type

DOI

10.1109/ISSM.1995.524412

Filename

524412

Link To Document