Title :
Nanolithography ߝ nanoimprinting
Author :
Nevludov, I.Sh. ; Palagin, V.A. ; Frizuk, E.A.
Author_Institution :
Kharkov Nat. Univ. of Radio Electron., Kharkov
Abstract :
In the article are represented the analysis of existent methods of nanolithography on the example of nanoimprinting, features of technological processes with the use of nanoimprinting, advantages and lacks of different methods and direction of their application are appraised.
Keywords :
X-ray lithography; electron beam lithography; masks; nanolithography; ultraviolet lithography; UV curing lithography; X-ray lithography; electron-beam lithography; lithographic mask; microelectronic devices; nanocontact print; nanoimprinting; nanolithography; photolithography; Electron beams; Electron emission; Lithography; Nanolithography; Optical devices; Optical distortion; Optical films; Optical materials; Resists; X-ray diffraction;
Conference_Titel :
Optoelectronic Physics and Technology, 2007. OPT '07. International Workshop on
Conference_Location :
Kharkov
Print_ISBN :
1-4244-1321-4
Electronic_ISBN :
1-4244-1322-2
DOI :
10.1109/OPT.2007.4298538
