DocumentCode
3353307
Title
First principle investigation of CrSi2 with doping V
Author
Wanjun Yan ; Shiyun Zhou ; Quan Xie ; Chunhong Zhang ; Zhongzheng Zhang
Author_Institution
Phys. & Electron. Sci. Dept., Anshun Univ., Anshun, China
Volume
4
fYear
2011
fDate
12-14 Aug. 2011
Firstpage
1747
Lastpage
1749
Abstract
The geometrical structure and electronic structure of CrSi2 with doping V were investigated by using first principle based on the plane wave pseudo-potential theory. The calculation of band structure result shows that the band gap decreased from 0.35eV (pure CrSi2) to 0.25eV (V doped). The valence band and conduction band near the Fermi energy is mainly composed of 3d state electron of Cr and 3p state electron of Si for pure CrSi2. After doping V atom, the Fermi energy moved into the valence band, the valence band and conduction band near the Fermi energy is mainly composed of 3d state electron of Cr and impurity atom V, the conductive type changed into p type, improve the electrical conductivity. It shows that doping plays a very important role to change conductivity of materials.
Keywords
APW calculations; Fermi level; ab initio calculations; chromium compounds; conduction bands; crystal structure; electrical conductivity; energy gap; pseudopotential methods; semiconductor materials; valence bands; vanadium; CrSi2:V; Fermi energy; band gap; band structure; conduction band; electrical conductivity; electronic structure; first principle investigation; geometrical structure; plane wave pseudopotential theory; valence band; Atomic layer deposition; Charge carrier processes; Conductivity; Doping; Silicon; Three dimensional displays; CrSi2 ; electronic structure; first principle; geometrical structure;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic and Mechanical Engineering and Information Technology (EMEIT), 2011 International Conference on
Conference_Location
Harbin, Heilongjiang, China
Print_ISBN
978-1-61284-087-1
Type
conf
DOI
10.1109/EMEIT.2011.6023006
Filename
6023006
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