Application of the digital holographic interference microscope for thin films investigation

Author

Tishko, D.N. ; Tishko, T.V. ; Titar, V.P. ; Zadneprovskiy, Yu.A. ; Kuprin, A.S. ; Zgoda, I.V.

Author_Institution

Karazin V.N. Kharkov Nat. Univ., Kharkov

fYear

2007

fDate

20-22 June 2007

Firstpage

70

Lastpage

71

Abstract

We used the digital holographic interference microscope (DHIM) for thin films investigation. Three-dimensional (3-D) image of A1N thin film deposited on an acryl substrate by vacuum-arc method .and the results of the film thickness measurement are presented. It has been shown that the DHIM can be successfully used for film surface quality control, thickness and film damages parameters measurement.

Keywords

III-V semiconductors; aluminium compounds; holography; optical microscopy; semiconductor thin films; wide band gap semiconductors; acryl substrate; digital holographic interference microscope; film damages parameters; film surface quality control; film thickness; thin films investigation; vacuum-arc method; Coatings; Holographic optical components; Holography; Interference; Optical films; Optical microscopy; Production; Substrates; Thickness measurement; Transistors;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic Physics and Technology, 2007. OPT '07. International Workshop on

Conference_Location

Kharkov

Print_ISBN

1-4244-1322-2

Electronic_ISBN

1-4244-1322-2

Type

conf

DOI

10.1109/OPT.2007.4298545

Filename

4298545