DocumentCode :
3353721
Title :
A MOSFET-structured Si tip for stable emission current
Author :
Hirano, T. ; Kanemaru, S. ; Itoh, J.
Author_Institution :
Electrotech. Lab., Tsukuba, Japan
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
309
Lastpage :
312
Abstract :
A current-controllable Si field emitter tip with a metal-oxide-semiconductor field-effect transistor (MOSFET) structure is proposed and demonstrated. The device has a simple structure in which a conical Si tip is made in the drain region of a MOSFET. The gate performs two roles; one is that of a conventional extraction gate and the other is that of a control gate for the drain current supplied to the tip. Experimental results showed that the emission current was well controlled and stabilized by the drain current Stable emission of about 0.8 /spl mu/A was obtained with a single tip. An extension to multi-gate MOSFET structure is also mentioned.
Keywords :
MOSFET; electron field emission; elemental semiconductors; silicon; vacuum microelectronics; 0.8 muA; MOSFET structure; Si; conical Si field emitter tip; control gate; drain current; emission current; extraction gate; Etching; FETs; Fabrication; Insulation; Ion implantation; Laboratories; MOSFET circuits; Niobium; Sensor arrays; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.553591
Filename :
553591
Link To Document :
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