• DocumentCode
    3353900
  • Title

    Short-term repeatability of a rad-hard EPI diode applied in electron processing dosimetry

  • Author

    Santos, Thais C dos ; Goncalves, Josemary A C ; Pintilie, Ioana ; Bueno, Carmen C.

  • Author_Institution
    CNEN, Inst. de Pesquisas Energeticas e Nucl. IPEN, Sao Paulo, Brazil
  • fYear
    2011
  • fDate
    23-29 Oct. 2011
  • Firstpage
    233
  • Lastpage
    236
  • Abstract
    The rad-hard EPI diode was characterized envisaging its application in on-line 1.5 MeV electron beam dosimetry in radiation processing. As expected from a current sensitivity loss (13.5%) to the accumulated dose up to 750 kGy, the EPI diode exhibited good short-term repeatability (CV = 1.9%) which is better than that required for CTA dosimeters, routinely applied in radiation processing. The dose-response curve of the EPI diode was fitted by a second order polynomial function for doses up to 775 kGy. In addition, some preliminary studies on the radiation damage effects induced in this diode using a Capacitance Deep Level Transient Fourier Spectroscopy system are presented. The results showed that up to almost 1.5 MGy only 3 defects (VO, V2 and CiOi) can influence the carrier lifetime and current generated. Further radiation damage studies are under way.
  • Keywords
    carrier lifetime; dosimetry; electron beams; polynomials; radiation effects; silicon radiation detectors; CTA dosimeters; capacitance deep level transient Fourier spectroscopy system; carrier lifetime; current sensitivity loss; dose-response curve; electron beam dosimetry; electron processing dosimetry; good short-term repeatability; rad-hard EPI diode; radiation damage effects; radiation processing; second order polynomial function; short-term repeatability; Current measurement; Dosimetry; Electron beams; Radiation effects; Semiconductor diodes; Sensitivity; Silicon; EPI diode; dosimetry; radiation processing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nuclear Science Symposium and Medical Imaging Conference (NSS/MIC), 2011 IEEE
  • Conference_Location
    Valencia
  • ISSN
    1082-3654
  • Print_ISBN
    978-1-4673-0118-3
  • Type

    conf

  • DOI
    10.1109/NSSMIC.2011.6154486
  • Filename
    6154486