High resolution AFM Moiré technique for the detection of defects in nano structure

Moire interferometry is a useful technique to assess the reliability of electronic package because Moire interferometry can measure the whole-field and real-time deformations. The optical limitation of Moire interferometry makes ambiguous the shear strain of a micro area. An atomic force microscope (AFM) is used to measure the profile of a micro site. High resolution of AFM can apply to the Moire technique. AFM Moire technique is useful to measure the strain of a small area. Also, AFM Moire technique is used to detect of defects in nano structure. In this research, the method to accurately measure the deformation of a small area by using AFM Moire is proposed. A phase-shifting method is applied to improve the resolution of AFM Moire.