• DocumentCode
    3354340
  • Title

    Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing

  • Author

    Peuse, Bruce ; Pfarr, Mike ; Timans, Paul ; Hu, Yaozhi

  • Author_Institution
    Mattson Technol., Fremont, CA
  • fYear
    2004
  • fDate
    2004
  • Firstpage
    61
  • Lastpage
    72
  • Abstract
    Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today´s advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time
  • Keywords
    rapid thermal annealing; semiconductor device manufacture; semiconductor technology; RTP equipment; advanced device manufacturing; advanced semiconductor device manufacturing; low pressure thermal module; thermal processing technology; Annealing; Dielectric films; Dielectric thin films; Heating; Lamps; Manufacturing; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor devices; Temperature control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. 12th IEEE International Conference on
  • Conference_Location
    Portland, OR
  • Print_ISBN
    0-7803-8477-6
  • Type

    conf

  • DOI
    10.1109/RTP.2004.1441938
  • Filename
    1441938