DocumentCode
3354340
Title
Leveraging a low pressure thermal module to meet the challenges of advanced device manufacturing
Author
Peuse, Bruce ; Pfarr, Mike ; Timans, Paul ; Hu, Yaozhi
Author_Institution
Mattson Technol., Fremont, CA
fYear
2004
fDate
2004
Firstpage
61
Lastpage
72
Abstract
Fulfilling the needs of advanced semiconductor device manufacturing presents continued challenges to the developers and manufacturers of capital equipment. More than twenty years of RTP equipment evolution and development has resulted in the availability of a select few technologies that are capable of delivering the demanding performance required to manufacturer today´s advanced semiconductor devices. This paper describes the development and characterization of a new low pressure RTP process module that was developed to fulfil some specific needs. With the use of proven existing thermal processing technology, the design, development, characterization and qualification of this module for device manufacturing was done in a very short period of time
Keywords
rapid thermal annealing; semiconductor device manufacture; semiconductor technology; RTP equipment; advanced device manufacturing; advanced semiconductor device manufacturing; low pressure thermal module; thermal processing technology; Annealing; Dielectric films; Dielectric thin films; Heating; Lamps; Manufacturing; Semiconductor device manufacture; Semiconductor device modeling; Semiconductor devices; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Advanced Thermal Processing of Semiconductors, 2004. RTP 2004. 12th IEEE International Conference on
Conference_Location
Portland, OR
Print_ISBN
0-7803-8477-6
Type
conf
DOI
10.1109/RTP.2004.1441938
Filename
1441938
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