Modeling of SOI based photonic crystals for far IR applications

Author

Chandrasekaran, Arvind ; Packirisamy, Muthukumaran ; Nerguizian, Vahé

Author_Institution

Dept. of Mech. & Ind. Eng., Concordia Univ.

Volume

4

fYear

2006

fDate

9-13 July 2006

Firstpage

3387

Lastpage

3390

Abstract

Photonic crystals devices are defined as periodic arrangement of the dielectric structures which allow propagation of only certain electromagnetic wave modes in the band gaps. In this work, SOI based photonic crystals have been modeled for far infrared (FIR) applications. The fabrication of photonic crystals has been carried out with the SOI MicraGeM process technology. The finite element modeling (FEM) of the photonic crystal waveguiding in FIR has been carried out and the results are presented

Keywords

finite element analysis; infrared spectra; photonic crystals; silicon-on-insulator; FEM; MicraGeM process technology; SOI; dielectric structures; electromagnetic wave modes; far IR applications; far infrared; finite element modeling; periodic arrangement; photonic crystal waveguiding; photonic crystals devices; Finite impulse response filter; Optical device fabrication; Optical scattering; Optical waveguides; Periodic structures; Photonic band gap; Photonic crystals; Resonance light scattering; Silicon on insulator technology; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Industrial Electronics, 2006 IEEE International Symposium on

Conference_Location

Montreal, Que.

Print_ISBN

1-4244-0496-7

Electronic_ISBN

1-4244-0497-5

Type

conf

DOI

10.1109/ISIE.2006.296010

Filename

4078938