Title :
Modeling deformation in microelectronics BGA solder joints under high current density. Part I. Simulation and testing
Author :
Ye, Hua ; Basaran, Cemal ; Hopkins, Douglas C. ; Lin, Minghui
Author_Institution :
Electron. Packaging Lab., SUNY, Buffalo, NY, USA
fDate :
31 May-3 June 2005
Abstract :
In this paper, Moire interferometry technique is used to measure the in-situ displacement evolution of lead-free solder joint under electric current stressing. Large deformation was observed in solder joint under high density (104A/cm2) current stressing. The deformation was found to be due to electromigration in the solder joint. An electromigration constitutive model is developed to simulate deformation of lead-free solder joint under current stressing. The simulation predicts reasonably close displacements results to Moire interferometry experimental results in both spatial distribution and time history evolution, which indicates that the electromigration model is reasonably good for predicting the mechanical behavior of lead-free solder alloy under electric current stressing. This is the first part of the papers reporting the deformation of solder joint under current stressing. More experimental results are reported in the second paper.
Keywords :
ball grid arrays; current density; deformation; electromigration; moire fringes; solders; Moire interferometry; ball grid arrays; current density; deformation modeling; displacement evolution; electric current stressing; electromigration constitutive model; lead-free solder joint; mechanical behavior prediction; microelectronics BGA solder joint; solder joint simulation; solder joint testing; Current density; Deformable models; Electromigration; Environmentally friendly manufacturing techniques; Interferometry; Lead; Microelectronics; Predictive models; Soldering; Testing;
Conference_Titel :
Electronic Components and Technology Conference, 2005. Proceedings. 55th
Print_ISBN :
0-7803-8907-7
DOI :
10.1109/ECTC.2005.1441975