DocumentCode :
3357796
Title :
Extremely high-power operation of 650 nm-band AlGaInP visible lasers with low optical absorption mirrors
Author :
Fukuhisa, T. ; Kidoguchi, I. ; Adachi, H. ; Tanaka, K. ; Mannoh, M. ; Takamori, A.
Author_Institution :
Semicond. Res. Center, Matsushita Electr. Ind. Co. Ltd., Osaka, Japan
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
409
Lastpage :
412
Abstract :
High-power operation of 650 nm-band GaInP/AlGaInP strained quantum well visible laser diodes were successfully demonstrated by introducing a hydrogenated amorphous-Si film (/spl alpha/-Si:H) for high reflection mirror. The /spl alpha/-Si:H film has lower optical absorption coefficient than conventional hydrogen-free /spl alpha/-Si film. Therefore, heat generation at the rear facet of the laser was expected to be suppressed. Fundamental-transverse-mode operation at 30 mW of output power up to 100/spl deg/C and the maximum lasing temperature of 115/spl deg/C were obtained. These lasers have operated more than 1000 h at 60/spl deg/C under a constant output power of 30 mW without degradation.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; indium compounds; laser mirrors; quantum well lasers; 30 mW; 60 to 115 C; 650 nm; GaInP-AlGaInP; GaInP/AlGaInP strained quantum well visible laser diode; Si:H; catastrophic optical damage; fundamental transverse mode; heat generation; high power operation; high reflection mirror; hydrogenated amorphous Si film; optical absorption coefficient; Diode lasers; Electromagnetic wave absorption; Mirrors; Optical films; Optical reflection; Power generation; Power lasers; Quantum well lasers; Temperature; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.553614
Filename :
553614
Link To Document :
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