[Commentary]

Summary form only given. Self-aligned double patterning (SADP) is a new technique that can enable the scaling of memory devices in the face of a serious lithography roadblock.is the primary double patterning approach for flash memory, developed in part by Applied Materials, that is gaining rapid momentum due to its superior pattern (line width) control and because it allows chip makers to use their existing, proven factory equipment. SADP is particularly suited to regular one-dimensional repeated patterns such as those of NAND-flash memory devices; it has already become the manufacturing strategy for designs below 35 nm.