Title :
Frequency tunable silicon carbide resonators for MEMS above IC
Author :
Nabki, F. ; Dusatko, T.A. ; El-Gamal, M.N.
Author_Institution :
McGill Univ., Montreal, QC
Abstract :
Micro-electromechanical beam resonators and arrays are fabricated using a custom low-temperature (< 300degC) CMOS-compatible silicon carbide micro-fabrication process. A special feature of this process is that it allows the integration of heaters directly onto the MEMS devices, thus enabling resonant frequency tuning with constant insertion loss and considerable extension of the tuning range. Characteristics for different devices are measured with quality factors of Q ap 1000 and resonant frequencies of up to 21.8 MHz.
Keywords :
CMOS integrated circuits; circuit tuning; microfabrication; micromechanical resonators; silicon compounds; CMOS-compatible silicon carbide microfabrication process; MEMS devices; constant insertion loss; frequency tunable silicon carbide resonators; microelectromechanical beam resonators; resonant frequency tuning; CMOS integrated circuits; Frequency measurement; Insertion loss; Microelectromechanical devices; Micromechanical devices; Q factor; Q measurement; Resonant frequency; Silicon carbide; Tuning;
Conference_Titel :
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2018-6
Electronic_ISBN :
978-1-4244-2019-3
DOI :
10.1109/CICC.2008.4672054