DocumentCode :
3360151
Title :
Characteristics and applications of a 0.6 /spl mu/m bipolar-CMOS-DMOS technology combining VLSI non-volatile memories
Author :
Contiero, C. ; Galbiati, P. ; Palmieri, M. ; Vecchi, L.
Author_Institution :
Dedicated Products Group, SGS-Thomson Microelectron., Milan, Italy
fYear :
1996
fDate :
8-11 Dec. 1996
Firstpage :
465
Lastpage :
468
Abstract :
This paper describes the 5th generation, designed at 0.6 /spl mu/m, of the BCD process family commercially introduced ten years ago. Called BCD5, this smart power process provides very dense and high performance bipolar, CMOS and DMOS functions and is compatible with VLSI EPROM, EEPROM and Flash Non-Volatile Memories. Extremely complex systems requiring analog, digital and power functions, /spl mu/P cores and significant amount of memories (hundreds of Kbits) can be realized in one chip (Super Smart Power integration) using BCD5.
Keywords :
BIMOS integrated circuits; EPROM; VLSI; integrated circuit technology; integrated memory circuits; power integrated circuits; 0.6 mum; BCD process family; BCD5; EEPROM; VLSI EPROM; VLSI nonvolatile memories; bipolar-CMOS-DMOS technology; extremely complex systems; flash nonvolatile memories; smart power process; super smart power integration; system oriented power technology; CMOS process; CMOS technology; EPROM; Flash memory; Implants; Nonvolatile memory; Plugs; Power integrated circuits; Very large scale integration; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1996. IEDM '96., International
Conference_Location :
San Francisco, CA, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-3393-4
Type :
conf
DOI :
10.1109/IEDM.1996.553627
Filename :
553627
Link To Document :
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