Title :
Characterization and design for variability and reliability
Author :
Nowka, Kevin ; Nassif, Sani ; Agarwal, Kanak
Author_Institution :
IBM Austin Res. Lab., Austin, TX
Abstract :
Device variability due to sub-wavelength lithography, layout complexity, and random effects is impacting manufacturable design. Defects, aging, and noise must also be accounted for in design and manufacturing. Characterization structures to quantify these effects, measured behaviors, the resulting models, and design and tools mitigation actions are presented in this paper.
Keywords :
design for manufacture; integrated circuit design; integrated circuit layout; integrated circuit reliability; lithography; IC industry; device variability; layout complexity; manufacturable design; reliability; subwavelength lithography; Aging; Lithography; Manufacturing;
Conference_Titel :
Custom Integrated Circuits Conference, 2008. CICC 2008. IEEE
Conference_Location :
San Jose, CA
Print_ISBN :
978-1-4244-2018-6
Electronic_ISBN :
978-1-4244-2019-3
DOI :
10.1109/CICC.2008.4672092
