DocumentCode :
3362246
Title :
Static power optimization of a Full-Adder under Front-End of Line systematic variations
Author :
Aghababa, Hossein ; Afzali-Kusha, Ali ; Forouzandeh, Behjat
Author_Institution :
Sch. of Electr. & Comput. Eng., Univ. of Tehran, Tehran, Iran
fYear :
2009
fDate :
15-17 Nov. 2009
Firstpage :
1
Lastpage :
6
Abstract :
Process variation as a major concern in the current and future generations of CMOS circuits manufacturing has imposed a great deal of effort in design process. Basically, process variations are generally divided in two main categories: random variations and systematic variations. Therefore, physical designers of integrated circuits (ICs) have to take into account the effects of random and systematic process variations in the design process. As the critical dimension (CD) of transistors scale down, the effects of Front-End of Line (FEOL) systematic variations have been proved to be a great contributor of performance variability of ICs. Because of Across Chip Line-Width (ACLV) variation during lithography process, the channel length of transistor is subject to remarkable variations. As a result, the performance of IC becomes highly sensitive to these variations. In this paper we propose a leakage-aware optimization methodology which improves the performance of circuit in terms of standby static power and power delay product (PDP). We apply this methodology on a conventional ripple-carry full-adder as a basic block in VLSI circuits and systems for verification purposes. Besides, this method effectively improves the static power yield by almost 14% in average.
Keywords :
CMOS integrated circuits; VLSI; integrated circuit design; leakage currents; logic devices; CMOS circuits; VLSI; critical dimension; full-adder; integrated circuit design; leakage-aware optimization; power delay product; power optimization; process variation; static power; CMOS technology; Circuits; Computer aided manufacturing; Constraint optimization; Lithography; Manufacturing processes; Optimization methods; Power dissipation; Process design; Timing; CMOS integrated circuits; leakage reduction; leakage-aware optimization; systematic variations;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design and Test Workshop (IDT), 2009 4th International
Conference_Location :
Riyadh
Print_ISBN :
978-1-4244-5748-9
Type :
conf
DOI :
10.1109/IDT.2009.5404117
Filename :
5404117
Link To Document :
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