Title :
Decomposition of gaseous organic contaminants by surface discharge induced plasma chemical processing-SPCP
Author :
Oda, Tetsuji ; Yamashita, Ryuuichi ; Haga, Ichiro ; Takahashi, Tadashi ; Masuda, Senichi
Author_Institution :
Dept. of Electr. Eng., Tokyo Univ., Japan
Abstract :
The decomposition performance of surface induced plasma chemical processing (SPCP) for chlorofluorocarbon, acetone, trichloroethylene, and isopropyl alcohol was experimentally examined. More than 90 or 99% removal rate was realized when the residence time was about 1 s and the input electric power for a 16 cm3 reactor was about 10 W. Acetone was the most stable material and alcohol was most easily decomposed. A gas-chromatograph-mass-spectrograph system was used for decomposition-product analysis. The decomposition of alcohol produced acetone as an undesirable byproduct of SPCD. The energy necessary to decompose one mole of each gas diluted in air was calculated from the experiments. The necessary energy for acetone and trichloroethylene was about one-tenth or one-twentieth of that for chlorofluorocarbon
Keywords :
chromatography; dissociation; mass spectroscopic chemical analysis; organic compounds; plasma applications; surface chemistry; surface discharges; 10 W; acetone; chlorofluorocarbon; decomposition performance; gas-chromatograph-mass-spectrograph system; gaseous organic contaminants; input electric power; isopropyl alcohol; surface discharge induced plasma chemical processing; trichloroethylene; Ceramics; Chemical processes; Chemical technology; Inductors; Organic chemicals; Plasma chemistry; Plasma materials processing; Surface contamination; Surface discharges; Testing;
Conference_Titel :
Industry Applications Society Annual Meeting, 1992., Conference Record of the 1992 IEEE
Conference_Location :
Houston, TX
Print_ISBN :
0-7803-0635-X
DOI :
10.1109/IAS.1992.244376