DocumentCode
3363733
Title
Contact improvement using E-beam and FIB deposited tungsten in carbon nanofiber interconnects
Author
Kanzaki, Nobuhiko ; Wilhite, Patrick ; Maeda, Shusaku ; Yamada, Toshishige ; Yang, Cary Y.
Author_Institution
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA, USA
fYear
2011
fDate
18-21 Oct. 2011
Firstpage
248
Lastpage
251
Abstract
In a carbon nanofiber (CNF) interconnect device, electrode contacts formed by tungsten (W) deposition using focused ion beam is effective in reducing the contact resistance, but can potentially damage the test device because of its high energy. We present here a comparison of results for CNF interconnect devices with contacts formed by electron-beam-induced and focused-ion-beam-induced W depositions.
Keywords
coating techniques; electrical contacts; electron beam deposition; interconnections; nanotechnology; CNF interconnect device; FIB deposited tungsten; carbon nanofiber interconnect device; contact improvement; contact resistance; e-beam; electron-beam-induced deposition; focused-ion-beam-induced W deposition; ion beam; test device; tungsten deposition; Current measurement; Electrodes; Irrigation; Silicon; carbon nanofiber; contact resistance; e-beam; focused ion beam; tungsten deposition;
fLanguage
English
Publisher
ieee
Conference_Titel
Nanotechnology Materials and Devices Conference (NMDC), 2011 IEEE
Conference_Location
Jeju
Print_ISBN
978-1-4577-2139-7
Type
conf
DOI
10.1109/NMDC.2011.6155354
Filename
6155354
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