Title :
Contact improvement using E-beam and FIB deposited tungsten in carbon nanofiber interconnects
Author :
Kanzaki, Nobuhiko ; Wilhite, Patrick ; Maeda, Shusaku ; Yamada, Toshishige ; Yang, Cary Y.
Author_Institution :
Center for Nanostruct., Santa Clara Univ., Santa Clara, CA, USA
Abstract :
In a carbon nanofiber (CNF) interconnect device, electrode contacts formed by tungsten (W) deposition using focused ion beam is effective in reducing the contact resistance, but can potentially damage the test device because of its high energy. We present here a comparison of results for CNF interconnect devices with contacts formed by electron-beam-induced and focused-ion-beam-induced W depositions.
Keywords :
coating techniques; electrical contacts; electron beam deposition; interconnections; nanotechnology; CNF interconnect device; FIB deposited tungsten; carbon nanofiber interconnect device; contact improvement; contact resistance; e-beam; electron-beam-induced deposition; focused-ion-beam-induced W deposition; ion beam; test device; tungsten deposition; Current measurement; Electrodes; Irrigation; Silicon; carbon nanofiber; contact resistance; e-beam; focused ion beam; tungsten deposition;
Conference_Titel :
Nanotechnology Materials and Devices Conference (NMDC), 2011 IEEE
Conference_Location :
Jeju
Print_ISBN :
978-1-4577-2139-7
DOI :
10.1109/NMDC.2011.6155354
