Laser-Induced Fluorescence Detection of OH Radicals Generated by Atmospheric-Pressure Nonequilibrium DC Pulse Discharge Plasma Jets

Author

Yuji, Toshifumi ; Mungkung, Narong ; Kawano, Hirokazu ; Kanazawa, Seiji ; Ohkubo, Toshikazu ; Akatsuka, Hiroshi

Author_Institution

Fac. of Educ. & Culture, Univ. of Miyazaki, Miyazaki, Japan

Volume

42

Issue

4

fYear

2014

fDate

Apr-14

Firstpage

960

Lastpage

964

Abstract

It has been proven that many types of radicals released from atmospheric-pressure plasma can provide effective surface treatment and modification of materials. However, the method for measuring radicals generated with atmospheric-pressure plasma and their reaction mechanisms have not become clear in material surface processing. The OH radical distribution was measured successfully in nonequilibrium atmospheric-pressure dc pulse discharge plasma jet by use of the laser-induced fluorescence system. The OH transition [A²Σ⁺(v\´ = 1) ← X²Π(v" = 0)] at 282 nm was used to monitor the ground-state OH radicals.

Keywords

free radicals; glow discharges; plasma diagnostics; plasma jets; plasma materials processing; surface treatment; OH radical distribution; OH transition; atmospheric-pressure nonequilibrium dc pulse discharge plasma jets; ground-state OH radicals; laser-induced fluorescence detection; laser-induced fluorescence system; material surface processing; pressure 1 atm; reaction mechanisms; surface treatment; wavelength 282 nm; Atmospheric measurements; Discharges (electric); Educational institutions; Measurement by laser beam; Plasma measurements; Plasmas; Surface treatment; Argon gas; OH radical; OH radical.; atmospheric-pressure plasma; dc pulse discharge; laser-induced fluorescence (LIF);

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2014.2306199

Filename

6766736