Title :
Effect of carrier concentration on the magnetic behavior of ferroelectric YMnO3 ceramics and thin films
Author :
Fujimura, N. ; Yamamori, S. ; Nakamoto, A. ; Ito, D. ; Yokota, T. ; Ito, T.
Author_Institution :
Dept. of Appl. Mater. Sci., Osaka Prefecture Univ., Japan
Abstract :
Magnetic properties of carrier controlled YMnO3 ceramics and undoped epitaxial films were studied. Stoichiometric polycrystalline bulk samples exhibit p-type conduction due to the existence of Mn4+. The I-V properties are well explained by Poole-Frenkel type carrier emission, and the activation energy is calculated to be 0.38 eV. The carrier density decreases by Zr doping and increases by Li or Mg doping. Although all the samples exhibit antiferromagnetic magnetization behavior against the applied magnetic field at 5 K, carrier doped samples displays parasitic ferromagnetic behavior (weak ferromagnetism). Epitaxial films also exhibit antiferromagnetism with little crystallographic anisotropy
Keywords :
Hall effect; Poole-Frenkel effect; antiferromagnetic materials; carrier density; ferroelectric ceramics; ferroelectric semiconductors; ferroelectric thin films; magnetic epitaxial layers; magnetic semiconductors; magnetisation; semiconductor epitaxial layers; weak ferromagnetism; yttrium compounds; 0.38 eV; 5 K; I-V properties; Poole-Frenkel type carrier emission; YMnO3; YMnO3:Li; YMnO3:Mg; YMnO3:Zr; activation energy; antiferromagnetic magnetization behavior; antiferromagnetism; carrier concentration; carrier density; carrier doped samples; epitaxial films; ferroelectric YMnO3 ceramics; ferroelectricYMnO3 thin films; magnetic properties; p-type conduction; parasitic ferromagnetic behavior; stoichiometric polycrystalline bulk samples; weak ferromagnetism; Antiferromagnetic materials; Ceramics; Charge carrier density; Doping; Magnetic anisotropy; Magnetic films; Magnetic properties; Magnetization; Perpendicular magnetic anisotropy; Zirconium;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.942398