Title :
Numerical simulation of the effects of space charge and Schottky barrier on ferroelectric thin films
Author :
Lo, V.C. ; Chen, Z.J.
Author_Institution :
Dept. of Appl. Phys., Hong Kong Polytech. Univ., Kowloon, China
Abstract :
The roles of space charge induced by oxygen vacancies and the Schottky barrier due to the electrode/film heterojunction are investigated numerically using Landau-Khalatnikov theory. In this model, the thin film is considered as the stacking of dipolar layers along the thickness direction. The free energy for each layer obeys the well-known double-well p4 model. By solving the one-dimensional Poisson equation, the non-uniform electric field is determined by the boundary condition imposed by the Schottky barrier as well as the space charge distribution inside the film. It is revealed that the asymmetric hysteresis p-E loop is the consequence of the unequal Schottky barriers at the two electrode/film interfaces. Moreover, the space charge distribution results in the distorted hysteresis loop. Both phenomena are detrimental effects for ferroelectric memory
Keywords :
Poisson equation; Schottky barriers; dielectric hysteresis; dielectric polarisation; ferroelectric thin films; free energy; numerical analysis; space charge; vacancies (crystal); Landau-Khalatnikov theory; Schottky barrier; asymmetric hysteresis p-E loop; boundary condition; dipolar layers; distorted hysteresis loop; double-well p4 model; electrode/film heterojunction; ferroelectric memory; ferroelectric thin films; free energy; nonuniform electric field; numerical simulation; one-dimensional Poisson equation; oxygen vacancies; space charge; space charge distribution; thickness direction; Electrodes; Ferroelectric films; Heterojunctions; Hysteresis; Numerical simulation; Poisson equations; Schottky barriers; Space charge; Stacking; Transistors;
Conference_Titel :
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
0-7803-5940-2
DOI :
10.1109/ISAF.2000.942413