• DocumentCode
    3364231
  • Title

    Numerical simulation of the effects of space charge and Schottky barrier on ferroelectric thin films

  • Author

    Lo, V.C. ; Chen, Z.J.

  • Author_Institution
    Dept. of Appl. Phys., Hong Kong Polytech. Univ., Kowloon, China
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    687
  • Abstract
    The roles of space charge induced by oxygen vacancies and the Schottky barrier due to the electrode/film heterojunction are investigated numerically using Landau-Khalatnikov theory. In this model, the thin film is considered as the stacking of dipolar layers along the thickness direction. The free energy for each layer obeys the well-known double-well p4 model. By solving the one-dimensional Poisson equation, the non-uniform electric field is determined by the boundary condition imposed by the Schottky barrier as well as the space charge distribution inside the film. It is revealed that the asymmetric hysteresis p-E loop is the consequence of the unequal Schottky barriers at the two electrode/film interfaces. Moreover, the space charge distribution results in the distorted hysteresis loop. Both phenomena are detrimental effects for ferroelectric memory
  • Keywords
    Poisson equation; Schottky barriers; dielectric hysteresis; dielectric polarisation; ferroelectric thin films; free energy; numerical analysis; space charge; vacancies (crystal); Landau-Khalatnikov theory; Schottky barrier; asymmetric hysteresis p-E loop; boundary condition; dipolar layers; distorted hysteresis loop; double-well p4 model; electrode/film heterojunction; ferroelectric memory; ferroelectric thin films; free energy; nonuniform electric field; numerical simulation; one-dimensional Poisson equation; oxygen vacancies; space charge; space charge distribution; thickness direction; Electrodes; Ferroelectric films; Heterojunctions; Hysteresis; Numerical simulation; Poisson equations; Schottky barriers; Space charge; Stacking; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    1099-4734
  • Print_ISBN
    0-7803-5940-2
  • Type

    conf

  • DOI
    10.1109/ISAF.2000.942413
  • Filename
    942413