Design and kinematics analysis of a 3-DOF precision positioning stage

This paper presents a novel 3-DOF precision positioning stage for nanoimprint lithograph (NIL). Due to the advantages such as high positioning accuracy, dexterity, low inertial, and balanced mechanical structure, a piezo-driven flexure-based parallel mechanism is utilized. Based on Pseudo-Rigid-Body modelling theory, the kinematics of the stage is developed by simplifying the single-axis flexure hinges as ideal revolute joints. A modified coefficient matrix is introduced to optimize the theoretic results and overcome the position error induced by the deformations of long links and flexure hinges. Finite element analysis is used to verify the kinematic performance of the stage and obtain the modified coefficient matrix. The numerical simulations are carried out to validate the established model.