Design of a new ferroelectrics-silicon integrated microphone and microspeaker

Author

Tian-Ling, Ren ; Lin-Tao, Zhang ; Li-Tian, Liu ; Zhi-Jian, Li

Author_Institution

Inst. of Microelectron., Tsinghua Univ., Beijing, China

Volume

2

fYear

2000

fDate

2000

Firstpage

885

Abstract

A new ferroelectrics-silicon integrated microphone and microspeaker is proposed. The Pt/Pb(Zr,Ti)O₃/Pt/SiO₂/Si₃N₄ cantilever structure is designed theoretically using multimorph model. The sensitivity and the sound pressure level (SPL) of the integrated microphone and microspeaker are calculated. It is found that the sensitivity of the microphone and the SPL of the microspeaker are very high. The new integrated microphone and microspeaker will be valuable for high quality micro-acoustic devices

Keywords

elemental semiconductors; ferroelectric devices; lead compounds; loudspeakers; microphones; microsensors; silicon; Pt-PZT-Pt-SiO₂-Si₃N₄; Pt-PbZrO3TiO3-Pt-SiO2-Si3N4; Pt/Pb(Zr,Ti)O₃/Pt/SiO₂/Si₃N ₄ cantilever structure; Si; ferroelectric-silicon integrated microphone/microspeaker; micro-acoustic device; multimorph model; sensitivity; sound pressure level; Air gaps; Electrodes; Fabrication; Ferroelectric materials; Hearing aids; Microelectronics; Microphones; Piezoelectric materials; Piezoelectric transducers; Silicon;

fLanguage

English

Publisher

ieee

Conference_Titel

Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on

Conference_Location

Honolulu, HI

ISSN

1099-4734

Print_ISBN

0-7803-5940-2

Type

conf

DOI

10.1109/ISAF.2000.942459

Filename

942459