DocumentCode
3365717
Title
Displacement property of PZT films prepared by CSD method
Author
Iijima, Takashi ; Wang, Zheng ; He, Gang ; Sanada, Norio
Author_Institution
MITI, Tohoku Nat. Ind. Res. Inst., Sendai, Japan
Volume
2
fYear
2000
fDate
2000
Firstpage
945
Abstract
Al-doped PZT films were prepared using a chemical solution deposition method, and the ferroelectric properties and the displacement properly of the texture oriented PZT films at high electric field were studied. The morphotropic-phase-boundary and rhombohedral PZT film were deposited on (111) oriented Pt layer formed Pt foil substrate, and the (100) or (111) preferred 2 μm-thick PZT film were fabricated by the control of pyrolysis temperature like PZT films deposited on Pt(111)/Ti/SiO2/Si substrates. In spite of relatively high applied field (about 1 MV/cm), P-E hysteresis curves of the Al-doped PZT thin films were fully saturated and showed comparable ferroelectric properties to bulk PZT ceramics. The displacement property caused by bending motion was measured at high applied field using bipolar and unipolar drive, and the piezoelectric constant, d31, were amounted to -116×10-12 m/V for the (100) preferred MPB PZT film and d31=-60×10-12 m/V for the (111) preferred rhombohedral PZT film
Keywords
aluminium; ferroelectric transitions; lead compounds; liquid phase deposited coatings; piezoelectric materials; piezoelectric thin films; 2 micron; CSD method; PZT films; PZT:Al; PbZrO3TiO3:Al; bipolar drive; chemical solution deposition method; displacement property; ferroelectric properties; hysteresis curves; piezoelectric constant; pyrolysis temperature; texture oriented PZT:Al films; unipolar drive; Ceramics; Chemicals; Displacement measurement; Ferroelectric films; Ferroelectric materials; Hysteresis; Piezoelectric films; Semiconductor films; Substrates; Temperature control;
fLanguage
English
Publisher
ieee
Conference_Titel
Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
Conference_Location
Honolulu, HI
ISSN
1099-4734
Print_ISBN
0-7803-5940-2
Type
conf
DOI
10.1109/ISAF.2000.942474
Filename
942474
Link To Document