• DocumentCode
    3365852
  • Title

    Influence of Nb additive on the properties of lead titanate thin film

  • Author

    Ohno, T. ; Fu, D.S. ; Ogawa, T. ; Suzuki, H. ; Ishikawa, K.

  • Author_Institution
    Dept. of Material Sci., Shizuoka Univ., Hamamatsu, Japan
  • Volume
    2
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    965
  • Abstract
    Thin films of Nb-doped PbTiO3 (PNT) were formed on Pt-coated Si by chemical solution deposition. The substitution of Nb for the Ti-site has been shown by the changes in profile of the lattice vibration related to the Ti cation. We have studied the influence of Nb additive on the structure, surface morphology and properties of the PNT film. The tetragonality of the film decreases with increasing Nb content. The dielectric constants of the films displayed strong frequency dependence. Although the Nb addition leads to the decrease in the polarization for PNT film, it effectively improves the properties of leakage current
  • Keywords
    Raman spectra; atomic force microscopy; dielectric hysteresis; dielectric polarisation; ferroelectric thin films; lead compounds; leakage currents; niobium; permittivity; phonon spectra; surface topography; Nb additive effects; Nb-doped PNT; PbTiO3:Nb; Si; Si-Pt; chemical solution deposition; dielectric constant; dielectric polarization; film structure; film tetragonality; frequency dependence; lattice vibration; lead titanate thin film; leakage current; surface morphology; Additives; Chemicals; Dielectric constant; Lattices; Lead; Niobium; Semiconductor thin films; Sputtering; Surface morphology; Titanium compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Applications of Ferroelectrics, 2000. ISAF 2000. Proceedings of the 2000 12th IEEE International Symposium on
  • Conference_Location
    Honolulu, HI
  • ISSN
    1099-4734
  • Print_ISBN
    0-7803-5940-2
  • Type

    conf

  • DOI
    10.1109/ISAF.2000.942493
  • Filename
    942493