Title :
A high-voltage pulse generator for plasma ion immersion implantation applications
Author :
Spassov, V.A. ; Ueda, M. ; Barroso, J. ; Gueorguiev, L.
Author_Institution :
Assoc. Plasma Lab., Nat. Inst. for Space Res., Sao Paulo, Brazil
fDate :
June 29 1997-July 2 1997
Abstract :
The design and construction of high-voltage pulse generator for applications in the treatment of metal and polymer materials by plasma ion immersion implantation (PIII) are described. The generator was built in a circuit category of pulse forming network (PFN), consisting of ten LC sections with L=300 /spl mu/H, C=2.5 nF and an air core high-voltage pulse transformer. The instrument was designed to produce an adjustable, several amperes, flat 70 kV pulse for over 15 /spl mu/s with a pulse repetition frequency (PRF) from 50 to 500 Hz. The generator is fed with a sinewave, constant high current source, and a 10 kV, 2 A switching power supply. The voltage and current pulse shapes of the PIII reactor using this pulse source are presented.
Keywords :
ion implantation; plasma applications; power supplies to apparatus; power transformers; pulse generators; pulse transformers; pulsed power technology; switched mode power supplies; transformer cores; 10 kV; 15 mus; 2 A; 2.5 nF; 50 to 500 Hz; 70 kV; LC sections; air core high-voltage pulse transformer; applications; current pulse shapes; high-voltage pulse generator; materials treatment; plasma ion immersion implantation; pulse forming network; pulse repetition frequency; pulsed power supplies; switching power supply; voltage pulse shapes; Building materials; Inorganic materials; Plasma applications; Plasma immersion ion implantation; Plasma materials processing; Polymers; Pulse generation; Pulse shaping methods; Pulse transformers; Pulsed power supplies;
Conference_Titel :
Pulsed Power Conference, 1997. Digest of Technical Papers. 1997 11th IEEE International
Conference_Location :
Baltimore, MA, USA
Print_ISBN :
0-7803-4213-5
DOI :
10.1109/PPC.1997.674621
