Title :
Surface micromachining in Silicon on Sapphire CMOS technology
Author :
Tejada, Francisco ; Andreou, Andreas G. ; Wickenden, Dennis K. ; Francomacaro, Arthur S.
Author_Institution :
Dept. of Electr. & Comput. Eng., Johns Hopkins Univ., Baltimore, MD, USA
Abstract :
We report on the design and fabrication of surface micromachined microelectromechanical structures (MEMS) in an ultra thin silicon (UTSi) on sapphire CMOS process [Peregrine Semiconductor (PE) Silicon on Sapphire (SOS) process]. This is the first demonstration of surface micromachined MEMS structures in a CMOS process fabricated on a sapphire substrate.
Keywords :
CMOS integrated circuits; elemental semiconductors; integrated circuit design; micromachining; micromechanical devices; semiconductor thin films; silicon; surface treatment; Al2O3; Peregrine semiconductor; SOS process; Si; sapphire substrate; silicon on sapphire CMOS technology; surface micromachined MEMS structures; surface micromachined microelectromechanical structures; surface micromachining; ultra thin silicon; CMOS process; CMOS technology; Capacitors; Fabrication; Laboratories; Micromachining; Micromechanical devices; Physics; Semiconductor device measurement; Silicon;
Conference_Titel :
Circuits and Systems, 2004. ISCAS '04. Proceedings of the 2004 International Symposium on
Print_ISBN :
0-7803-8251-X
DOI :
10.1109/ISCAS.2004.1329155
