Automation of engineering lot split-less for research and development fab

Author

Orimoto, Junji ; Sugikawa, Yutaka ; Sada, Toshihiro ; Kabata, Kazuo ; Miyoshi, Hiroki ; Nagata, Tomotaka ; Shirai, Hidenori

Author_Institution

VLSI Manuf. Eng. Div., NEC Corp., Sagamihara, Japan

fYear

1999

fDate

1999

Firstpage

93

Lastpage

96

Abstract

Recently the market demands quick turn around time (TAT) to highly advanced R&D fab. The analysis on the lot TAT in our fab showed that the time for engineering lot split at ion implantation process reached to about 7.2% of the total lot TAT. The automation to enable split-less engineering lot at ion implantation could reduce the operation time in R&D fab. Engineering lot split-less systems could reduce the operation time with lot split operation by 3/4 for ion implantation. This system consists of manufacturing execution system (MES), master maintenance system (MMS), and engineering management system (EMS). This realized the 24 hours automated transfer of Engineering lot without any lot split operations

Keywords

factory automation; integrated circuit manufacture; ion implantation; research and development management; automation; engineering lot split-less; engineering management system; ion implantation; manufacturing execution system; master maintenance system; operation time; research and development fab; semiconductor wafer fabrication; turn around time; Automotive engineering; Ion implantation; Level control; Manufacturing automation; National electric code; Production; Research and development; Research and development management; Systems engineering and theory; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on

Conference_Location

Santa Clara, CA

ISSN

1523-553X

Print_ISBN

0-7803-5403-6

Type

conf

DOI

10.1109/ISSM.1999.808746

Filename

808746