Title :
Evaluation of 300 mm wafer boxes with UV/photoelectron cleaning capability
Author :
Yokoyama, S. ; Hara, Yoshitaka ; Yoshino, T. ; Suzuki, T. ; Fujii, T. ; Ohyama, K.
Author_Institution :
Res. Center for Nanodevices & Syst., Hiroshima Univ., Japan
Abstract :
New plastic wafer boxes with cleaning capability for gaseous contamination harmful to LSI fabrication processes have been developed. The contamination gases are effectively reduced by attaching a UV/photoelectron cleaning unit to the conventional polycarbonate plastic box. The performance of the wafer boxes has been verified by a reliability test of thin gate oxides fabricated on Si wafers stored in the boxes. It is also shown that a newly developed plastic material is superior to polycarbonate in terms of the organic molecule contaminants
Keywords :
MOS capacitors; ULSI; chromatography; contact angle; electron-surface impact; integrated circuit manufacture; integrated circuit packaging; integrated circuit reliability; plastic packaging; surface cleaning; surface contamination; ultraviolet radiation effects; 300 mm; 300 mm wafer boxes; LSI fabrication process; MOS capacitors; Si wafers; Si-SiO2; ULSI manufacture; UV/photoelectron cleaning capability; gaseous contamination; gate oxide reliability; organic molecule contaminants; plastic material; plastic wafer boxes; polycarbonate plastic box; reliability test; thin gate oxides; total ion chromatography spectra; Cleaning; Fabrication; Gases; Large scale integration; MOS capacitors; Material storage; Plastics; Surface contamination; Ultra large scale integration; Water storage;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808764
