DocumentCode :
3367535
Title :
Fabrication and characterization of a clover type position sensitive detector
Author :
Kim, Youngmin ; Wang, Wanjun ; Neikirk, Dean P. ; Busch-Vishniac, Ilene J.
Author_Institution :
Texas Univ., Austin, TX, USA
fYear :
1992
fDate :
12-14 May 1992
Firstpage :
404
Lastpage :
408
Abstract :
A new type of lateral-effect position-sensitive photodetector (PSD) has been fabricated on silicon using standard IC technology. The new geometry is called a clover PSD. The experimental performance of tetralateral, pin-cushion, and clover PSDs is compared in terms of measurement linearity and sensitivity. The distortion in linearity is more severe than the simulated values in every case, since the diffused layers in the devices were not uniform. It is observed that the clover PSD has better linearity than both pin-cushion and tetralateral PSDs. The sensitivity of the clover PSD is found to be twice as high as that of the pin-cushion PSD, whereas theory predicts a five times improvement. The discrepancy is explained in terms of the much higher sensitivity of the clover PSD to contact and external parasitic resistances
Keywords :
elemental semiconductors; integrated circuit technology; photodetectors; silicon; Si; Si:B; clover PSD; diffusion; distortion; external parasitic resistances; lateral-effect position-sensitive photodetector; measurement linearity; position sensitive detector; sensitivity; standard IC technology; Costs; Delay; Distortion measurement; Doping; Fabrication; Geometry; Linearity; Photodetectors; Position sensitive particle detectors; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Instrumentation and Measurement Technology Conference, 1992. IMTC '92., 9th IEEE
Conference_Location :
Metropolitan, NY
Print_ISBN :
0-7803-0640-6
Type :
conf
DOI :
10.1109/IMTC.1992.245108
Filename :
245108
Link To Document :
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