Title :
Novel assessment of process control monitor in advanced semiconductor manufacturing: a complete set of addressable failure site test structures (AFS-TS)
Author :
Sunnys Hsieh ; Lin, Sheng-Che ; Lee, Ming-Huei ; Wang, Jian-Rong ; Lin, Chingfu ; Huang, Chia-Wen ; Cheng, Jye-Yen ; Yang, Yu-Hao ; Doong, Kelvin Yih-Yuh ; Miyamoto, Koji ; Hsu, Charles Ching-Hsiang
Author_Institution :
Worldwide Semicond. Manuf. Corp., Shinchu, Taiwan
Abstract :
This work describes the implementation of a novel assessment of process control monitor in advanced semiconductor manufacturing. It manifests the design and simulation results of addressable failure site test structures. Four novel test structures with three level interconnects have been developed and validated with an in-house simulation system. The novel test structures are used to identify the locations of killer defects. A test chip of 22×6.6 mm2 containing four types test structures was implemented using a 0.25 μm logic backend of line process. This simple and efficient test structure for killer defect identification demonstrated its superiority in yield enhancement
Keywords :
failure analysis; fault location; fault simulation; integrated circuit interconnections; integrated circuit testing; integrated circuit yield; process control; process monitoring; 0.25 mum; addressable failure site test structures; advanced semiconductor manufacturing; design; fault modeling; fault testing; killer defect location; logic backend of line process; process control monitor assessment; simulation; three level interconnects; yield enhancement; Circuit testing; Foundries; Logic testing; Manufacturing processes; Monitoring; Phase change materials; Process control; Random access memory; Semiconductor device manufacture; System testing;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808781