Ultraviolet step-index silica single mode fiber as a spatial filter for interference lithography

Author

Mikolas, David ; En-Chiang Chang ; Pao-Te Lin ; Yi-Lin Sun ; Chien-Chung Fu

Author_Institution

Inst. of NEMS, Nat. Tsing Hua Univ., Hsinchu, Taiwan

fYear

2013

fDate

6-9 July 2013

Firstpage

240

Lastpage

241

Abstract

We present the use of single mode optical fiber (SMF) as an effective and superior spatial filter as a source for an expanded ultraviolet beam used in interference lithography (IL). IL is used to produce nanopatterned structures with a period of 220nm in photoresist on samples over areas of many square centimeters. The SMF further acts as a flexible laser beam transport system replacing relay mirrors. Finally we demonstrate that with normal SMF (not polarization maintaining) it is still possible to preserve linear polarization over 60cm length of fiber with a purity of 100:1. The output UV beam is shown to fit the far-field intensity pattern of a single LP₀₁ with a numerical aperture of 0.09.

Keywords

laser beams; laser mirrors; nanolithography; nanopatterning; photoresists; silicon compounds; spatial filters; SMF; SiO₂; far-field intensity pattern; interference lithography; laser beam transport system; nanopatterned structures; numerical aperture; photoresist; relay mirrors; single mode optical fiber; spatial filter; ultraviolet beam; ultraviolet step-index silica; Laser beams; IL; SMF; UV; Ultraviolet; interference lithography; nanopattern; single mode fiber;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Infocomm Technology (ICAIT), 2013 6th International Conference on

Conference_Location

Hsinchu

Print_ISBN

978-1-4799-0464-8

Type

conf

DOI

10.1109/ICAIT.2013.6621571

Filename

6621571