• DocumentCode
    3368041
  • Title

    p--layer punch-through structure with high concentration p-emitter for a light-triggered thyristor

  • Author

    Katoh, Shuji ; Choi, Jai Ho ; Yokota, Takeshi ; Watanabe, Atsuo ; Yamaguchi, Tetsuo ; Saito, Katsuaki

  • Author_Institution
    Res. Lab., Hitachi Ltd., Ibaraki, Japan
  • fYear
    1998
  • fDate
    3-6 Jun 1998
  • Firstpage
    225
  • Lastpage
    228
  • Abstract
    We studied the on-state voltage reduction of a light-triggered thyristor from the viewpoints of reduced thyristor thickness and realization of a high-injection low-lifetime structure. The reduced thickness was achieved through a p--layer punch-through structure. The high injection was achieved by a thick, highly-doped p-emitter region. The on-state voltage of a 6-kV 5.5-kA light-triggered thyristor with the p--layer punch-through structure and with the thick, high concentration p-emitter was reduced by about 0.2 V
  • Keywords
    doping profiles; photoconducting devices; photothyristors; semiconductor device testing; 5.5 kA; 6 kV; high concentration p-emitter; high-injection low-lifetime structure; light-triggered thyristor; on-state voltage reduction; p--layer punch-through structure; thick highly-doped p-emitter region; thyristor thickness; Capacitors; HVDC transmission; Laboratories; Power transmission; Propagation losses; Shape; Snubbers; Thyristors; Valves; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices and ICs, 1998. ISPSD 98. Proceedings of the 10th International Symposium on
  • Conference_Location
    Kyoto
  • ISSN
    1063-6854
  • Print_ISBN
    0-7803-4752-8
  • Type

    conf

  • DOI
    10.1109/ISPSD.1998.702674
  • Filename
    702674