Title :
High-speed and sensitive multiple-point ammonia gas monitor system
Author :
Matsuyoshi, Y. ; Satoh, Yuuichi ; Shinozaki, Tsutomu ; Suzuki, Eiko ; Nagata, Norimasa
Author_Institution :
Production Eng. Dev. Lab., NEC Corp., Kanagawa, Japan
Abstract :
In order to get a precise pattern control in a chemically amplified photo-resist process, the high performance multi-point ammonia gas monitor was developed. A single point high speed and sensitive ammonia monitor was reported in ISSM´96. This system has expanded its ability by adding 16 measurement ports, 4 diffusion scrubbers, and one analyzer. As a result, it provided the capability of measuring 9 sampling data for each point per day. Its sensitivity is sub μg/m3 which is enough to watch, for example to detect the change of people in a clean-room, and it is able to monitor 40 meters away in radius. This system is already in a field test, and it shows a good performance for daily watch of our new research and development line
Keywords :
ammonia; clean rooms; gas sensors; integrated circuit manufacture; photoresists; process monitoring; production testing; NH3; chemically amplified photo-resist process; clean-room; diffusion scrubbers; field test; measurement ports; multiple-point ammonia gas monitor system; precise pattern control; sampling data; Accidents; Cleaning; Conductivity measurement; Monitoring; National electric code; Pollution measurement; Resists; Sampling methods; Velocity measurement; Watches;
Conference_Titel :
Semiconductor Manufacturing Conference Proceedings, 1999 IEEE International Symposium on
Conference_Location :
Santa Clara, CA
Print_ISBN :
0-7803-5403-6
DOI :
10.1109/ISSM.1999.808823
