DocumentCode
3369368
Title
Investigation of enhancement-mode metamorphic InAlAs/InGaAs HEMTs by Schottky metal diffusion
Author
Lin, Cheng-Kuo ; Wu, Jing-Chang ; Wang, Wen-Kai ; Chan, Yi-Jen
Author_Institution
Dept. of Electr. Eng., Nat. Central Univ., Chung-li, Taiwan
fYear
2004
fDate
31 May-4 June 2004
Firstpage
198
Lastpage
201
Abstract
In this report, we have developed the enhancement mode (E-mode) InAlAs/InGaAs metamorphic HEMT´s (mHEMTs) on GaAs substrates by using the thermally annealed Schottky metal diffusion approach. The activation energy of platinum (Pt) Schottky metal was systematically carried out. Based on the extracted device small-signal model, the improved devices rf transconductance (gm) is more significantly than the increased gate-to-source capacitance (Cgs) after the Schottky metal diffusion, due to the reduction of gate-to-channel separation. Moreover, it also exhibits a high voltage gain and capacitance ratio resulting in a higher maximum oscillation frequency.
Keywords
III-V semiconductors; Schottky effect; aluminium compounds; annealing; capacitance; electric admittance; gallium arsenide; high electron mobility transistors; indium compounds; platinum; thermal diffusion; GaAs; InAlAs-InGaAs; Pt; activation energy; enhancement-mode metamorphic HEMT; gate-to-channel separation; gate-to-source capacitance; platinum; rf transconductance; thermally annealed Schottky metal diffusion approach; Annealing; Capacitance; Gallium arsenide; HEMTs; Indium compounds; Indium gallium arsenide; MODFETs; Platinum; Transconductance; mHEMTs;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
ISSN
1092-8669
Print_ISBN
0-7803-8595-0
Type
conf
DOI
10.1109/ICIPRM.2004.1442645
Filename
1442645
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