• DocumentCode
    3369368
  • Title

    Investigation of enhancement-mode metamorphic InAlAs/InGaAs HEMTs by Schottky metal diffusion

  • Author

    Lin, Cheng-Kuo ; Wu, Jing-Chang ; Wang, Wen-Kai ; Chan, Yi-Jen

  • Author_Institution
    Dept. of Electr. Eng., Nat. Central Univ., Chung-li, Taiwan
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    198
  • Lastpage
    201
  • Abstract
    In this report, we have developed the enhancement mode (E-mode) InAlAs/InGaAs metamorphic HEMT´s (mHEMTs) on GaAs substrates by using the thermally annealed Schottky metal diffusion approach. The activation energy of platinum (Pt) Schottky metal was systematically carried out. Based on the extracted device small-signal model, the improved devices rf transconductance (gm) is more significantly than the increased gate-to-source capacitance (Cgs) after the Schottky metal diffusion, due to the reduction of gate-to-channel separation. Moreover, it also exhibits a high voltage gain and capacitance ratio resulting in a higher maximum oscillation frequency.
  • Keywords
    III-V semiconductors; Schottky effect; aluminium compounds; annealing; capacitance; electric admittance; gallium arsenide; high electron mobility transistors; indium compounds; platinum; thermal diffusion; GaAs; InAlAs-InGaAs; Pt; activation energy; enhancement-mode metamorphic HEMT; gate-to-channel separation; gate-to-source capacitance; platinum; rf transconductance; thermally annealed Schottky metal diffusion approach; Annealing; Capacitance; Gallium arsenide; HEMTs; Indium compounds; Indium gallium arsenide; MODFETs; Platinum; Transconductance; mHEMTs;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442645
  • Filename
    1442645