Title :
Low-cost embedded Flash memory technology
Author :
Sun, Wein-Town ; Liu, Cheng-Jye ; Lo, Chun-Yuan ; Ting, Yun-Jen ; Chen, Ying-Je ; Wu, Tai-Yi ; Toh, Eng-Huat ; Yuan, Xiao-Hong ; Low, Ko-Li ; Han, Qiu ; You, Young-Seon ; Leung, Ying-Keung ; Woo, Swee-Tuck
Author_Institution :
Ememory Technol. Inc., Hsinchu, Taiwan
Abstract :
A simple and low cost logic based single poly Flash memory technology, NeoFlash®, with fast programming and high reliability is demonstrated in this paper. Programming with channel hot-hole-induced hot-electron injection and erasure with uniform channel Fowler-Nordheim tunneling are utilized to achieve fast programming, high endurance and good reliability characteristics. Owing to its simple cell structure and operation schemes, only 3 additional non-critical masks are needed, and the complexity of process integration and device tuning is much reduced. The SONOS based technology has been successfully embedded into 0.35μm ~ 65nm CMOS logic process. Because of electrons stored in nitride layer of ONO film, no tail bit during endurance and retention test is observed. As a result, NeoFlash® is a promising embedded Flash technology for SoC applications.
Keywords :
CMOS logic circuits; flash memories; reliability; system-on-chip; CMOS logic process; NeoFlash; ONO film nitride layer; SONOS based technology; SoC applications; cell structure; channel Fowler-Nordheim tunneling; channel hot-hole-induced hot-electron injection; device tuning; logic based single polyflash memory technology; low-cost embedded flash memory technology; noncritical masks; reliability; Degradation; Flash memory; Logic gates; Nonvolatile memory; Programming; Reliability; SONOS devices; Flash memory; Nonvolatile memory; SONOS devices;
Conference_Titel :
IC Design & Technology (ICICDT), 2011 IEEE International Conference on
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-4244-9019-6
DOI :
10.1109/ICICDT.2011.5783211