Title :
Selective formation of InAs quantum dot arrays by direct deposition of indium nano-dots using a nano-jet probe
Author :
Ohkouchi, S. ; Nakamura, Y. ; Nakamura, H. ; Asakawa, K.
Author_Institution :
Femtosecond Technol. Res. Assoc., Ibaraki, Japan
fDate :
31 May-4 June 2004
Abstract :
We propose a new nano-probe-assisted technique which enables the formation of site-controlled InAs quantum dots (QDs). High-density two-dimensional indium (In) nano-dot arrays on a GaAs substrate were fabricated by using a specially designed atomic-force-microscope (AFM) probe (the nano-jet probe). This developed probe has a hollow pyramidal tip with a sub-micron size aperture on the apex and an In-reservoir tank within the stylus. By applying a voltage pulse between the pyramidal tip and the sample, In clusters were extracted from the reservoir tank within the stylus through the aperture, resulting in the In nano-dot formation. These In nano-dots were directly converted to InAs arrays by subsequent annealing with irradiation of arsenic flux.
Keywords :
III-V semiconductors; annealing; atomic force microscopy; indium compounds; molecular beam epitaxial growth; nanotechnology; semiconductor growth; semiconductor quantum dots; AFM; GaAs; In-reservoir tank; InAs; annealing; arsenic flux; atomic-force-microscope; indium nanodots; nanojet probe; nanoprobe-assisted technique; quantum dot arrays; Apertures; Atomic force microscopy; Gallium arsenide; Indium; Optical microscopy; Probes; Quantum dots; Scanning electron microscopy; US Department of Transportation; Ultrafast optics;
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
Print_ISBN :
0-7803-8595-0
DOI :
10.1109/ICIPRM.2004.1442701