DocumentCode :
3370836
Title :
High-frequency characteristics and saturation electron velocity of InAlAs/InGaAs metamorphic high electron mobility transistors at high temperatures
Author :
Ono, Hideki ; Taniguchi, Satoshi ; Suzuki, Takumi
Author_Institution :
Dept. of Adv. Devices R&D, Sony Corp., Kanagawa, Japan
fYear :
2004
fDate :
31 May-4 June 2004
Firstpage :
288
Lastpage :
291
Abstract :
We fabricated InAlAs/InGaAs metamorphic high electron mobility transistors (MHEMTs) with several indium contents. High-frequency performance of the MHEMTs was measured at high temperatures up to 473 K. By the delay time analysis, we have estimated saturation electron velocity. Temperature dependence of the saturation electron velocity for the MHEMTs with higher indium contents exhibits deviations from a theory.
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; high-frequency effects; indium compounds; InAlAs-InGaAs; delay time analysis; indium; metamorphic high electron mobility transistors; saturation electron velocity; Delay estimation; Electron mobility; HEMTs; Indium compounds; Indium gallium arsenide; MODFETs; Temperature measurement; Time measurement; Velocity measurement; mHEMTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
ISSN :
1092-8669
Print_ISBN :
0-7803-8595-0
Type :
conf
DOI :
10.1109/ICIPRM.2004.1442711
Filename :
1442711
Link To Document :
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