DocumentCode :
3371064
Title :
Indium phosphide crystal growth from phosphorus-rich melt
Author :
Sun, Niefing ; Mao, Luhong ; Zhou, Xiaulong ; Wu, Xawan ; Guo, Weilzun ; Hu, Ming ; Li, Lingxiu ; Mi Xiao ; Liao, Bin ; Yang, Guangyao ; Fu, Jiande ; Yao, Zhihong ; Zhao, Yanjun ; Yang, Kewu ; Sun, Tongnian
Author_Institution :
Sch. of Electron. Inf. Eng., Tianjin Univ., China
fYear :
2004
fDate :
31 May-4 June 2004
Firstpage :
326
Lastpage :
329
Abstract :
P-rich of InP crystals are rather difficult to achieve, due to the high phosphorus pressure at the melting point. By using the P-injection in-situ synthesis method, there is excessive phosphorus in the melt. In the conditions of MIn < MIn-s, [P]mol>[In]mol, the melt might be P-rich. Since a high thermal stress exists in the LEC growth process with large temperature gradient, it is difficult to release stress, a large number of dislocations come into being around the pores. The pores are distributed in the ingots irregularly. The diameter of the pores is from <0.5 mm to 15 mm on the same wafer. The polished sample wafers with pores were characterized by PL mapping. Dislocations and pores in InP ingots are investigated by means of chemical etching, scanning electron microscopy (SEM). The experimental results show that the cell structures induced by movement and reaction of higher density dislocations exist at the edge of the pores. The EPD around the pores are higher than the other regions and the PL intensities are also inhomogeneous.
Keywords :
III-V semiconductors; crystal growth from melt; dislocations; etching; indium compounds; ingots; melting point; photoluminescence; porous semiconductors; scanning electron microscopy; semiconductor growth; thermal stresses; InP; LEC growth; P-injection in-situ synthesis method; PL mapping; SEM; chemical etching; dislocations; indium phosphide crystal growth; ingots; melting point; phosphorus-rich melt; scanning electron microscopy; thermal stress; Chemicals; Costs; Crystals; Etching; Indium phosphide; Scanning electron microscopy; Substrates; Temperature; Thermal factors; Thermal stresses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
ISSN :
1092-8669
Print_ISBN :
0-7803-8595-0
Type :
conf
DOI :
10.1109/ICIPRM.2004.1442721
Filename :
1442721
Link To Document :
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