• DocumentCode
    3371064
  • Title

    Indium phosphide crystal growth from phosphorus-rich melt

  • Author

    Sun, Niefing ; Mao, Luhong ; Zhou, Xiaulong ; Wu, Xawan ; Guo, Weilzun ; Hu, Ming ; Li, Lingxiu ; Mi Xiao ; Liao, Bin ; Yang, Guangyao ; Fu, Jiande ; Yao, Zhihong ; Zhao, Yanjun ; Yang, Kewu ; Sun, Tongnian

  • Author_Institution
    Sch. of Electron. Inf. Eng., Tianjin Univ., China
  • fYear
    2004
  • fDate
    31 May-4 June 2004
  • Firstpage
    326
  • Lastpage
    329
  • Abstract
    P-rich of InP crystals are rather difficult to achieve, due to the high phosphorus pressure at the melting point. By using the P-injection in-situ synthesis method, there is excessive phosphorus in the melt. In the conditions of MIn < MIn-s, [P]mol>[In]mol, the melt might be P-rich. Since a high thermal stress exists in the LEC growth process with large temperature gradient, it is difficult to release stress, a large number of dislocations come into being around the pores. The pores are distributed in the ingots irregularly. The diameter of the pores is from <0.5 mm to 15 mm on the same wafer. The polished sample wafers with pores were characterized by PL mapping. Dislocations and pores in InP ingots are investigated by means of chemical etching, scanning electron microscopy (SEM). The experimental results show that the cell structures induced by movement and reaction of higher density dislocations exist at the edge of the pores. The EPD around the pores are higher than the other regions and the PL intensities are also inhomogeneous.
  • Keywords
    III-V semiconductors; crystal growth from melt; dislocations; etching; indium compounds; ingots; melting point; photoluminescence; porous semiconductors; scanning electron microscopy; semiconductor growth; thermal stresses; InP; LEC growth; P-injection in-situ synthesis method; PL mapping; SEM; chemical etching; dislocations; indium phosphide crystal growth; ingots; melting point; phosphorus-rich melt; scanning electron microscopy; thermal stress; Chemicals; Costs; Crystals; Etching; Indium phosphide; Scanning electron microscopy; Substrates; Temperature; Thermal factors; Thermal stresses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
  • ISSN
    1092-8669
  • Print_ISBN
    0-7803-8595-0
  • Type

    conf

  • DOI
    10.1109/ICIPRM.2004.1442721
  • Filename
    1442721