DocumentCode
3371738
Title
Simple Technique for Direct Patterning of Nanowires using a Nanoslit Shadow-Mask
Author
Tong, H.D. ; Jansen, H.V. ; Tas, N.R. ; Gadgil, V.J. ; Carlen, E.T. ; van den Berg, A.
Author_Institution
Univ. of Twente & MESA+ Inst. for Nanotechnology, Enschede
fYear
2007
fDate
10-14 June 2007
Firstpage
191
Lastpage
194
Abstract
Nanowires of various lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 mum have been realized. Measurements of electrical I- V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm.
Keywords
coating techniques; ion beam applications; machining; nanotechnology; nanowires; wafer-scale integration; deposition windows; direct patterning; ion beam machining; metallic nanowires; nanoslit shadow mask; wafer-scale shadow mask; Assembly; Biomembranes; Fabrication; Machining; Nanoscale devices; Nanowires; Semiconductor device manufacture; Semiconductor materials; Silicon compounds; Substrates; Nanowires; focused-ion-beam machining; nanofabrication; nanoslit shadow-mask;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300103
Filename
4300103
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