Title :
Simple Technique for Direct Patterning of Nanowires using a Nanoslit Shadow-Mask
Author :
Tong, H.D. ; Jansen, H.V. ; Tas, N.R. ; Gadgil, V.J. ; Carlen, E.T. ; van den Berg, A.
Author_Institution :
Univ. of Twente & MESA+ Inst. for Nanotechnology, Enschede
Abstract :
Nanowires of various lengths and widths have been fabricated using a wafer-scale shadow mask with deposition windows, or nanoslits, created with focused ion beam machining. Metallic nanowires with widths down to 50 nm and lengths up to 100 mum have been realized. Measurements of electrical I- V characteristics show linear behavior of nanowires with widths and thickness each around 50 nm.
Keywords :
coating techniques; ion beam applications; machining; nanotechnology; nanowires; wafer-scale integration; deposition windows; direct patterning; ion beam machining; metallic nanowires; nanoslit shadow mask; wafer-scale shadow mask; Assembly; Biomembranes; Fabrication; Machining; Nanoscale devices; Nanowires; Semiconductor device manufacture; Semiconductor materials; Silicon compounds; Substrates; Nanowires; focused-ion-beam machining; nanofabrication; nanoslit shadow-mask;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300103
