Title :
Growth of dislocation free grade Fe doped InP crystals
Author :
Noda, Akira ; Nakamura, Masashi ; Arakawa, Atsutoshi ; Hirano, Ryuichi
Author_Institution :
Dept. of Compound Semicond. Mater., Nikko Mater. Co. Ltd., Ibaraki, Japan
fDate :
31 May-4 June 2004
Abstract :
3-inch Fe doped dislocation-free (DF) grade (dislocation density < 500 cm-2) InP crystals were grown by the phosphorus vapor controlled liquid-encapsulated Czochralski (PC-LEC) method. By controlling the solid/liquid (S/L) interface shape and reducing the axial temperature gradient, the dislocation density of 3-inch Fe doped InP crystals below 500 cm-2 was achieved for the whole ingot. The average dislocation density per a wafer was 100 cm-2 at lowest. The dislocation density of 4-inch Fe doped InP crystals was also reduced to less than 5 × 103 cm-2 by this method.
Keywords :
III-V semiconductors; crystal growth from melt; dislocations; indium compounds; ingots; iron; semiconductor growth; 3 inch; InP:Fe; dislocation density; ingot; phosphorus vapor controlled liquid-encapsulated Czochralski method; solid-liquid interface; Crystalline materials; Crystals; Etching; Indium phosphide; Iron; Photodetectors; Semiconductor materials; Shape control; Substrates; Temperature control;
Conference_Titel :
Indium Phosphide and Related Materials, 2004. 16th IPRM. 2004 International Conference on
Print_ISBN :
0-7803-8595-0
DOI :
10.1109/ICIPRM.2004.1442779