A 100kV/200A Blumlein Pulser for High-Energy Plasma Implantation

Author

Rossi, J.O. ; Ueda, M.

Author_Institution

Nat. Inst. for Space Res., Sao Jose dos Campos

fYear

2005

fDate

13-17 June 2005

Firstpage

1037

Lastpage

1040

Abstract

A high voltage pulsed power supply of 100 kV/200 A with output short pulses on the order 1 mus (based on stacked coaxial Blumlein technology) was developed for use in surface treatment of materials by plasma implantation. The plasma implantation process requires pulse repetition and our device is capable of operating at a frequency range of 10-150 Hz, depending on the level of the output voltage. Herein, we show that using this pulser nitrogen-ion species were implanted at high energies (>30keV) into stainless steel (SS304) surfaces inducing alpha-phase as demonstrated by X-ray diffraction. Moreover, micro-hardness tests in several samples (Al, Ti and SS304) after the treatment with high-energy ions have shown an improvement of the hardness factor.

Keywords

X-ray diffraction; plasma applications; pulsed power supplies; Blumlein pulser; X-ray diffraction; frequency 10 Hz to 150 Hz; high voltage pulsed power supply; high-energy plasma implantation; microhardness tests; pulser nitrogen-ion species; stacked coaxial Blumlein technology; stainless steel; Coaxial components; Frequency; Plasma devices; Plasma materials processing; Pulsed power supplies; Steel; Surface treatment; Testing; Voltage; X-ray diffraction;

fLanguage

English

Publisher

ieee

Conference_Titel

Pulsed Power Conference, 2005 IEEE

Conference_Location

Monterey, CA

Print_ISBN

0-7803-9189-6

Electronic_ISBN

0-7803-9190-x

Type

conf

DOI

10.1109/PPC.2005.300479

Filename

4084398