Title :
A High Aspect Ratio, Flexible, Transparent and Low-Cost Parylene-C Shadow Mask Technology for Micropatterning Applications
Author :
Selvarasah, S. ; Chao, S.H. ; Chen, C.-L. ; Mao, D. ; Hopwood, J. ; Ryley, S. ; Sridhar, S. ; Khademhosseini, A. ; Busnaina, A. ; Dokmeci, M.R.
Author_Institution :
Northeastern Univ., Boston
Abstract :
In this paper, we present a flexible parylene-C shadow mask technology for creating microscale patterns on flat and curved surfaces. The smallest feature size of 4 mum is demonstrated and the technology is scalable up to full wafer size. With the addition of SU-8 pillars, we also demonstrate multi mask processing with an alignment accuracy of about 5-6 mum. To achieve the smallest features, a low temperature and high aspect ratio (>8:1) parylene etch process is also developed. Utilizing this shadow mask, we successfully patterned proteins and cells on various surfaces (glass, PDMS, methacrylate) up to 9 times. This technology has potential applications for patterning proteins, cells and organic transistors on conventional and/or unconventional substrates.
Keywords :
bioMEMS; cellular biophysics; etching; masks; micromechanical devices; organic semiconductors; proteins; transistors; alignment accuracy; high aspect ratio parylene etch process; low-cost parylene-C shadow mask technology; micropatterning applications; multimask processing; organic transistors; patterned cells; patterned proteins; size 4 mum; Adhesives; Glass; Large-scale systems; Plasma applications; Plasma temperature; Polymers; Proteins; Silicon; Sputter etching; Surface topography; Flexible Shadow masks; High Aspect Ratio Polymer Etching; Parylene-C;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300185
