DocumentCode
3373244
Title
Photosensitive Poly(Dimethylsiloxane) (Photopdms) for Rapid and Simple Polymer Fabrication
Author
Bhagat, Ali Asgar S ; Jothimuthu, Preetha ; Papautsky, Ian
Author_Institution
Univ. of Cincinnati, Cincinnati
fYear
2007
fDate
10-14 June 2007
Firstpage
537
Lastpage
540
Abstract
In this paper, we report a new and simple method of patterning polydimethylsiloxane (PDMS) directly under normal ambient light for rapid prototyping of disposable microfluidic lab-on-a-chips (LOCs). The photodefinable PDMS (photoPDMS) is positive-acting and only sensitive to light below 365 nm, which permits processing outside a gold room. A parametric study was conducted to optimize this novel fabrication technique. Features as small as 100 mum were successfully fabricated using photoPDMS. To further demonstrate the potential of this novel technique, thin (< 30 mum) free-standing patterned PDMS films. Successful demonstration of this novel process presents a feasibly simpler alternative approach for rapid prototyping of disposable microfluidic biochips for lab-on-a-chip applications.
Keywords
bioMEMS; lab-on-a-chip; microfluidics; microsensors; optical polymers; polymer films; rapid prototyping (industrial); LOC; PDMS patterning; disposable microfluidic lab-on-a-chips; microfluidic biochips; photodefinable PDMS; photosensitive poly(dimethylsiloxane); polymer fabrication; rapid prototyping; Costs; Curing; Fabrication; Glass; Gold; Lab-on-a-chip; Microfluidics; Polymers; Prototypes; Wafer scale integration; PDMS; benzophenone; photo-definable; photoPDMS;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location
Lyon
Print_ISBN
1-4244-0842-3
Electronic_ISBN
1-4244-0842-3
Type
conf
DOI
10.1109/SENSOR.2007.4300186
Filename
4300186
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