DocumentCode :
3373244
Title :
Photosensitive Poly(Dimethylsiloxane) (Photopdms) for Rapid and Simple Polymer Fabrication
Author :
Bhagat, Ali Asgar S ; Jothimuthu, Preetha ; Papautsky, Ian
Author_Institution :
Univ. of Cincinnati, Cincinnati
fYear :
2007
fDate :
10-14 June 2007
Firstpage :
537
Lastpage :
540
Abstract :
In this paper, we report a new and simple method of patterning polydimethylsiloxane (PDMS) directly under normal ambient light for rapid prototyping of disposable microfluidic lab-on-a-chips (LOCs). The photodefinable PDMS (photoPDMS) is positive-acting and only sensitive to light below 365 nm, which permits processing outside a gold room. A parametric study was conducted to optimize this novel fabrication technique. Features as small as 100 mum were successfully fabricated using photoPDMS. To further demonstrate the potential of this novel technique, thin (< 30 mum) free-standing patterned PDMS films. Successful demonstration of this novel process presents a feasibly simpler alternative approach for rapid prototyping of disposable microfluidic biochips for lab-on-a-chip applications.
Keywords :
bioMEMS; lab-on-a-chip; microfluidics; microsensors; optical polymers; polymer films; rapid prototyping (industrial); LOC; PDMS patterning; disposable microfluidic lab-on-a-chips; microfluidic biochips; photodefinable PDMS; photosensitive poly(dimethylsiloxane); polymer fabrication; rapid prototyping; Costs; Curing; Fabrication; Glass; Gold; Lab-on-a-chip; Microfluidics; Polymers; Prototypes; Wafer scale integration; PDMS; benzophenone; photo-definable; photoPDMS;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
Type :
conf
DOI :
10.1109/SENSOR.2007.4300186
Filename :
4300186
Link To Document :
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