Title :
Self-Formed High-Aspect-Ratio Polymer Nanopillars by RIE
Author :
Chen, M.H. ; Hsu, T.H. ; Chuang, Y.-J. ; Chen, P.-H. ; Tseng, F.G.
Author_Institution :
Nat. Tsing Hua Univ., Hsinchu
Abstract :
In this work, a novel fabrication process of self-formed polymer nanopillars by reactive ion etching (RIE) is proposed. During this one-step RIE process, polymer nanopillars were generated adjacent XPS surface analysisto glass slide that was partially covered on treated polymer of either PDMS or parylene C. The surface morphologies and water contact angles were compared for different RIE parameters of RF-power and etching time. The aspect-ratio and water contact angle of nanopillar could reach 10 and 162.6deg, respectively. Furthermore, the mechanism of this novel fabrication process was established based on the evidences of nanopillar distribution and XPS surface analysis.
Keywords :
X-ray photoelectron spectra; contact angle; nanotechnology; polymers; sputter etching; surface morphology; RIE; XPS surface analysis; high-aspect-ratio; reactive ion etching; self-formed polymer nanopillars fabrication; surface morphology; water contact angle; Actuators; Etching; Fabrication; Glass; Nanopatterning; Polymers; Solid state circuits; Spectroscopy; Surface morphology; USA Councils; PDMS; RIE; XPS; high-aspect-ratio; nanopillars; superhydrophobic;
Conference_Titel :
Solid-State Sensors, Actuators and Microsystems Conference, 2007. TRANSDUCERS 2007. International
Conference_Location :
Lyon
Print_ISBN :
1-4244-0842-3
Electronic_ISBN :
1-4244-0842-3
DOI :
10.1109/SENSOR.2007.4300192
